Used MRC 902 #9171689 for sale

MRC 902 is an advanced sputtering equipment designed for thin-film deposition. It uses direct current (DC) or radio frequency (RF) power sources to generate a rarefied plasma containing energetic ions, which then impact the substrate and the target material surface to cause sputtering. 902 sputtering system is composed of a vacuum chamber, a target holder, a substrate holder and a power supply. The vacuum chamber is the main chamber of the unit, which is where the sputtering process takes place. It must be airtight and must be able to achieve and maintain a vacuum. The target holder holds the sputtering target material, which can be of different compositions depending on the desired thin film material. The substrate holder is used to hold the substrate on which the thin film will be deposited. The power supply is the source of power used to generate the plasma; it can be either DC or RF. The machine has an additional in-situ oxygen pressure controller, which can be used to adjust oxygen pressure during the sputtering process for better film quality. To ensure a uniform thin film deposition, the target is mounted on a rotatable shield, which provides uniform coverage to the substrates. In order to start the sputtering process, the vacuum chamber must be evacuated. Two pumps are used: a roughing pump to reach a low pressure and a diffusion pump to reduce the pressure further. Once the pressure is low enough, the power supply is used to generate a plasma inside the chamber. The energetic ions in the plasma can then impinge on the substrate and the target, causing sputtering. The sputtered material sublimates and then condenses on the substrate, forming the thin-film. The process can be adjusted mechanically and it is easy to user. The tool is equipped with an automatic control asset, which allows the user to easily adjust the parameters of sputtering, such as the voltage and the current. It also has a data logging model, which can be used to monitor the process in real time and log any changes. MRC 902 sputtering equipment provides an excellent platform for thin-film deposition. It is suitable for a wide range of applications, such as the production of conductive, optical, and protective thin films. It is energetic efficient and produces uniform, homogenous thin film coatings with excellent properties.