Used MRC 903 #9242553 for sale

MRC 903 is a sputtering equipment designed to deposit thin-film materials onto surfaces in order to create thin-film structures. The system consists of a vacuum chamber, vacuum pumps, a sputtering gun, auto-load chambers, and a computer-controlled sputter power supply. 903 has an integrated rotary vane pump to maintain low pressure inside the vacuum chamber. The pump is connected to the chamber inlet for evacuation of air at atmospheric pressure. The chamber can evacuate the gas in the chamber down to 1x10-6 torr. This allows a large variety of materials and substrates to be processed. The sputtering gun inside the chamber is used to sputter the film onto the substrate from a target material. The sputtering energy is generated by negatively charging the target material inside a vacuum chamber as well as by an injector gun that emits energetic ions. The sputtering process produces a thin film of deposited material on the substrate. To maximize the production process, MRC 903 employs auto-load chambers which can hold multiple substrates. Once the substrates are in place in the chamber, the sputtering process begins. The chamber is evacuated to a suitable pressure and the computer-controlled sputter power supply is used to provide the necessary power to the target material. Once the film is deposited, the substrate can be moved to the evaporator in order to heat it up. The evaporation process produces a uniform film, which is then transferred to the cooling chamber for cooling. Once the film is cooled, it is ready to be used in a variety of applications. 903 has an integrated computer unit which allows for programming and monitoring of the entire sputtering process. The process can be customized to suit various substrates, films and application requirements. This makes it possible to deposit a wide variety of materials at high deposition rates with a high level of accuracy and uniformity. Overall, MRC 903 is an efficient sputtering machine that offers the user precise and repeatable film deposition. The advanced computer tool allows for full customization of the process, ensuring high quality and uniform thin-films are deposited. The asset is suitable for a variety of materials, substrates, and applications.