Used MRC 903M #9166698 for sale

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MRC 903M
Sold
Manufacturer
MRC
Model
903M
ID: 9166698
RF Sputtering system (3) Target Cryo pumped CTI Cryotorr 8 Loadlock Target size: 5" x 15" (3) RF Cathodes (1) RF Etch Heating function: No MKS 252 Exhaust valve controller Facility: 208 V, 100.0 A, 60 Hz, 3 Phase Currently warehoused.
MRC 903M sputtering equipment is a device used in thin film deposition for enhancing the properties of substrates like metals and semiconductors. It can deposit a compound or an elemental alloy onto the substrate's surface in a precisely controlled and uniform way. MRC 903 M is specifically designed to perform magnetron sputtering, a process where a magnetic field is used to produce an arc from the object being sputtered onto the substrate. This process can be used to improve the electrical conductivity or corrosion resistance of the substrate. 903M is also capable of RF sputtering, which is an alternative form of sputtering. 903 M is a vacuum system that is equipped with a high-power sputtering source and a turbomolecular pump for maintaining ultra-high vacuum. It also features a multiple-stroke controller and a programmable logic controller for controlling the temperature, pressure, and duration of the sputtering process. This unit can accurately control the sputtering gas pressure, allowing for very thin films to be deposited. In addition, it is also capable of depositing two different types of metals simultaneously on the same substrate. MRC 903M is very reliable and capable of consistently and accurately performing multiple sputtering processes on a wide variety of substrates. It can run continuously for long periods of time without any significant reduction in its performance. Moreover, the machine is very flexible and can be easily adjusted for different types of sputtering processes. It is also easy to maintain and very cost-effective in comparison to other sputtering systems. Due to its versatile capabilities, MRC 903 M sputtering tool is ideal for use in a variety of industries where thin film deposition is required. Examples of these industries include solar energy, optoelectronics, microelectronics, and medical supplies. Its ability to perform multiple sputtering processes on a single substrate makes it a highly efficient device that allows for precise and cost-effective fabrication.
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