Used MRC 944 #9023648 for sale

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MRC 944
Sold
Manufacturer
MRC
Model
944
ID: 9023648
Sputtering system.
MRC 944 is a dual-planar magnetron sputtering equipment designed to provide high performance deposition for optoelectronic and other high technology applications. It is a four-cathode, two-chamber system that can accommodate both high power and high-rate depositions. The unit is equipped with an advanced Glid CoplanarTM target attachment machine, and its integrated, multi-frequency power supplies allow for precise control and flexibility. The tool is capable of depositing a variety of films, including high purity metals, conductors, dielectrics, mono and multi-layer stacks, or combinations thereof. The chamber design also allows for a variety of process gases including argon, oxygen, nitrogen, or combinations thereof. 944 integrates two separate sputter sources and two chambers for independent operation. This design offers high production capacity and flexibility with production rates up to 1.1m2/hr. The chambers are easily and quickly exchanged and provide fast cycle times, offering additional flexibility. A substrate loading station allows for rapid and efficient sample placement. The asset is designed for high temperature, high vacuum environments and is outfitted with water-cooled, magnetic shields, making it ideal for high-performance thin film deposition. The shields offer additional protection during deposition of sensitive materials. The model also features advanced monitoring and control capabilities, allowing for improved process accuracy and repeatability thanks to a series of powerful feedback loops. When combined with deposit mapping and rate monitoring, this equipment allows for thorough process control and optimization. MRC 944 also features a unique electrode position control system that allows for fine adjustment of sputter parameters, even during a running process. This feature ensures that the deposition of highly precise, nanometer-scale thin films is possible. Overall, 944 is a sophisticated sputtering unit that can be used to manufacture a range of optoelectronic, optomechanical and other high-performance components. This machine offers reliability, confidence and flexibility to users, allowing them to produce high-precision thin films that meet their quality and performance objectives.
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