Used MRC Eclipse #9225158 for sale

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Manufacturer
MRC
Model
Eclipse
ID: 9225158
Wafer Size: 8"
Vintage: 2009
Sputtering system, 8" Chamber 1: Process: ALSI Chamber 2: Process: TI Chamber 3: Process: AL Sputter chamber 1 / 2 / 3: Type, 8" DC Power: AE Cryo pump: CTI 8F RF Chamber: Process: Hard etch RF Power: AE Cryo pump: CTI 8F Main frame: Robot type, 8" Alignment Load lock cryopump: CTI Onboard 8 Compressor: Type 1: (2) 9600 Type 2: SUZUKI EBARA A10S Dry pump System monitor: Front panel Remote control 2009 vintage.
MRC Eclipse is an advanced sputtering equipment designed and manufactured by MRC for precision thin-film deposition. The multi-target sputtering system is a high productivity tool for materials research, process development, batch production, and quality control applications. The unit utilizes high-performance sputtering technology to deposit uniform thin films on substrates of various sizes and compositions. Eclipse is designed and built with various innovative features that enable it to quickly and accurately deposit thin films with near atomic layer precision. MRC Eclipse is equipped with a versatile set of components that allow users to configure the machine to their specific needs. The tool utilizes a high-T5 DC magnetron sputter source with 2, 3, or 4 target capabilities, an ion source for controlling the working environment, and an optional pumping asset for vacuum management. Eclipse also features an advanced controller that allows users to control and monitor the sputter process in real-time, enabling precise control of sputter parameters such as deposition rate, gas flow, and substrate temperature. MRC Eclipse is designed for use in a range of applications, including thin-film deposition for solar cells, displays, electron microscopy, and more. The model's advanced features and multiple target capabilities make it suitable for materials research, process development, batch production, and quality control. Eclipse is also designed to be compatible with a variety of substrates and target materials, making it an ideal choice for many different thin-film deposition projects. MRC Eclipse is a reliable sputtering equipment that is designed for accurate and consistent thin-film deposition. It is an ideal choice for a variety of applications, offering users high-performance sputtering capabilities and precision thin-film deposition. The system is designed for fast and easy installation and operation, and the advanced controller ensures precise and consistent sputtering operations. Eclipse is an excellent choice for researchers and manufacturers seeking a reliable and efficient sputtering unit.
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