Used MRC Mark II #9269893 for sale

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MRC Mark II
Sold
Manufacturer
MRC
Model
Mark II
ID: 9269893
Wafer Size: 6"
Sputtering system, 6".
MRC Mark II is a sputtering equipment developed by MRC Technologies and used in a wide variety of industries and applications. It is a multi-component evaporation system with the ability to perform sputtering, thin film deposition and thermal evaporation. Mark II can accommodate a variety of sputtering cathodes, target materials and sizes depending on the desired end application. It is a closed-loop unit with ambient pressure, enabling a wide range of process parameters to be maintained. MRC Mark II features a durable and chemical-resistant 6 mm thick stainless steel chamber, along with two 0.5" thick quartz viewports with shutters to aid in the monitoring of the deposition process. A rotating shuttle with a substrate holder allows for easy transfer between process modules. Its advanced multi-stage filtration machine prevents contamination of the process chamber and protects the sputtered targets from oxidation. Mark II is capable of performing multi-layer deposition in both vacuum or atmosphere. Its lifter allows for uniform deposition on uneven sample surfaces and its variable power supplies give precise control of the ion energy, giving it the capability to deposit metals, oxides, and nitrides. Its plasma-source power supplies control the ion bombardment and sputter rates, while its 12-position rotary table quickly transfers samples between processes. MRC Mark II also has the capacity to be used in various combinations of deposition examples. Examples include RF/DC sputtering, magnetron sputtering, ion beam sputtering, physical deposition, and thermal evaporation. It can be combined with a variety of deposition sources to form a chamber into an IBS-RF-sputtering tool for example, allowing for the deposition of ultra-thin and multi-layered films on a variety of substrate materials. Its modern control and monitoring features include real-time process and temperature monitoring, process diagnostics, and variable gas purge rate control. This allows for precise monitoring of the overall process and for the repeatability of parameters for executing high-quality thin films. Mark II is an ideal solution for laboratories and production facilities in need of thin film deposition for a variety of applications and materials.
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