Used MRC / MATERIALS RESEARCH CORPORATION SS-8633 #132274 for sale

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ID: 132274
Sputtering system, parts system No turbo pump Targets / RF Generator included.
MRC / MATERIALS RESEARCH CORPORATION SS-8633 is a state-of-the-art sputtering equipment, developed for the deposition of thin films and nanostructured materials onto substrates such as semiconductor wafers, glasses and metals. The system utilizes three independent sputtering sources for combination of various materials, providing improved coverage and optimal deposition rates. The sputtering sources utilize two-target cathode design, allowing for a wide range of target materials and deposition rates. The unit also includes adjustable sputtering pressure, temperature and gas flow monitoring. The machine is ideal for process control and optimization of high-quality thin films, with precision control of sputter gun currents and other process parameters, minimizing film non-uniformity. MRC SS-8633 also features an advanced infrared sensor, which provides feedback and control on the process temperature. The tool is equipped with water circulation and an advanced cooling management asset with an automatic shutoff valve to prevent overcooling. MATERIALS RESEARCH CORPORATION SS-8633 is ideal for durable and repeatable sputtering processes, with a quick target changeover time and minimal downtime between sputtering runs. The model offers improved thin-film uniformity, with precise process control and repeatability across all parts of the substrate. SS-8633 also features a wide range of available process gases, offering reactivity to a range of different materials. In addition, MRC / MATERIALS RESEARCH CORPORATION SS-8633 integrates with a variety of other process control and automation systems for increased productivity and process flexibility. Along with a broad range of process gases and process control, MRC SS-8633 offers precision thin film deposition for a variety of application and research needs. The equipment is also equipped with a user-friendly graphical user interface (GUI), allowing users to quickly setup and monitor the processes. Overall, MATERIALS RESEARCH CORPORATION SS-8633 serves as an innovative, precise and highly efficient sputtering tool, designed to quickly and accurately deposit thin films and nanostructured materials on a variety of substrates. The system features precise sputter gun control, adjustable sputtering pressure, process monitoring, cooling management and a variety of process gases. In addition, the unit is also compatible with a wide range of other process control and automation systems, providing improved versatility and productivity.
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