Used PERKIN ELMER 2400-8L #9193484 for sale

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ID: 9193484
Sputtering system (3) Cathodes: 8" Sputter configuration: RF/DC Load-lock Turbo pumped Table spacing: Adjustable cathode-substrate Substrate pallet diameter maximum: 6.5".
PERKIN ELMER 2400-8L is a sputtering equipment equipped with three sputtering sources that allows efficient and uniform deposition of thin layers. It is specifically designed for materials research that requires the deposition of thin layers of various materials for sample analysis or manufacturing. The system is well suited for the deposition of layers for glow discharge optical emission spectrometry (GDOES) applications and heterogeneous substrates. The unit features 8-inch diameter sputter chambers configured with RF power supplies, 13.56 MHz RF matching networks and three sputter sources. The RF power supplies are designed to provide up to 1 kW of power while the RF matching networks allow accurate adjustment of the voltage and current between 5 and 12 kV. The motion systems are mounted on sturdy structures for accurate and repeatable positioning of the substrate that has a sample cavity inner diameter of 8.3 inches. The three standard sputter sources are designed to accommodate different materials combinations and multiple magnetron configurations. Each source features a 1.675-inch nozzle diameter for excellent control of the sputter component and a 6-inch diameter stainless steel source chamber for reduced abrasion of focused ion beam (FIB)-milled substrates. The magnetic field generated from the sputter sources is adjustable allowing for unique design features that enhance sputter uniformity and deposition rate. A three-channel adjustable timer is also provided to allow for precise control of the sputtering process. All of these features provide outstanding flexibility and precise control for deposition and replicateable processes. The machine is housed in a common steel enclosure and is designed for optimal accessibility to all components. The front panel features a full-featured control/display unit that allows easy access to process parameters and data acquisition. A simple and straightforward graphical user interface (GUI) allows users to quickly and easily set up and monitor the tool. In conclusion, 2400-8L is an ideal sputtering asset for materials research that requires deposition of thin layers for both sample analysis and manufacturing. This model is equipped with three sputter sources and adjustable timers that are user-friendly and provide outstanding flexibility and precision control for deposition and replicateable processes.
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