Used PERKIN ELMER 2400 #9245229 for sale

PERKIN ELMER 2400 is a high-quality sputtering equipment for the deposition of thin metal films on substrates. The system is equipped with four sputter sources that can deposit aluminum, chromium, titanium, or gold onto a substrates. It has precise control of multiple sputter and substrate parameters including sputter rate, ion current, and substrate temperature. The unit also has an advanced controller that enables the deposition of multiple layers with precision. With this machine, users can achieve high quality, uniform, and repeatable thin film deposition. 2400 utilizes a turbo-molecular pump tool for accurate control of substrate and process temperatures. The asset is also capable of controlling the concentration of species in the deposition chamber for consistent film quality. This model is great for coating substrates up to 8 inches in diameter with a wide range of metal films. The PE-PERKIN ELMER 2400 also offers excellent uniformity across the substrate surface. Film uniformity, line-width, and step coverage can be precisely controlled. In addition, ion bombardment during sputtering increases the micro-structural integrity of the film. The PE-2400 sputtering equipment is suited for a variety of applications including optics, electronics, and medical applications. The system is capable of producing high density, low-absorption optical and dielectric films. The thinness, hardness and uniformity produced by PERKIN ELMER sputtering systems make them suitable for a variety of electronics applications, such as display panels, sensors, and MEMS devices. Metallization performed by the unit is also applicable to the biotechnology and medical device devices. The PE-PERKIN ELMER 2400 can be used to coat implantable devices with protective layers such as tantalum or titanium nitride. 2400 sputtering machine can be installed in any standard laboratory. This tool requires minimal maintenance and is easy to use. The PE-PERKIN ELMER 2400 is a low-vacuum asset with a film deposition rate of 17ìm/s. Overall, 2400 is a high-quality sputtering model for thin film deposition on substrates. The equipment is equipped with four sputter sources and has precise control of many parameters, including sputter rate, ion current, and substrate temperature. It is well suited for a variety of applications in optics, electronics, and medical devices. The system is highly reliable, easy to use, and requires minimal maintenance.