Used PERKIN ELMER 4400 #169590 for sale

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Manufacturer
PERKIN ELMER
Model
4400
ID: 169590
RF deposition/bias mode and etch On-board CTI cryo pump included PE Throttle valve HENRY 2KW RF Generator.
PERKIN ELMER 4400 is a sputtering equipment, which uses a high vacuum environment to deposit thin films of metal or other materials onto a substrate. This process is carried out in a chamber, usually made up of a cylindrical chamber, a grounded substrate holder and a target mounted on a motor driven spindle. The substrate is positioned on the holder and the target is placed on the spindle in a chamber, which is then evacuated to a base pressure of 0.1-0.3 mTorr or better. The chamber is then back-filled with a gas, which is typically Argon, to a pressure of 4-10 mTorr. The spindle is driven by a DC power supply, which produces an electric field in the chamber, and the target is bombarded with charged particles such Ar+ or ArXe+ ions. These particles cause sputtering of the target material, which is deposited onto the substrate to form a thin film. To ensure that uniform coverage is achieved, the target is usually rotated during sputtering. Different targets can be used depending on the desired material to be deposited, and deposition rates can be controlled by varying the power supplied to the DC power supply. Additionally, different gases can be used to modify the film that is produced. For example, the use of oxygen during Ar sputtering will increase the affinity of the deposited film for oxygen thereby increasing the film's adhesion to the substrate. 4400 sputtering system is an advanced unit which has been designed to meet stringent requirements of thin-film deposition. It is equipped with an advanced vacuum monitor and control unit, which permits users to monitor and adjust the vacuum pressure during the deposition process. It is also equipped with a unique automated chamber opening procedure, which allows for the exchange of targets without breaking the vacuum. This machine has several advanced features, such as a fast-start feature, which reduces the time required to get the tool up and running, and a fast-stop feature, which shuts down the asset quickly and safely. In summary, PERKIN ELMER 4400 sputtering model is a highly advanced equipment, which provides users with a fast and controlled method of depositing thin films to create a wide variety of applications. It is ideal for creating ultra-thin layers of materials, such as in solar cell applications, or for medical applications. Its unique features and user-friendly design make it an ideal system for creating reliable and cost-effective thin-film deposition.
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