Used PERKIN ELMER 4400 #48874 for sale

PERKIN ELMER 4400 is a high-end sputtering equipment designed to provide state-of-the-art performance and reliability. This versatile system is ideal for a range of applications including semiconductor device fabrication, advanced packaging, functionalization of large area substrates, and nanotechnology. 4400 is capable of sputtering various metals, alloys, and oxides onto a variety of substrates. At the heart of PERKIN ELMER 4400 is a rotatable 5-target sputtering chamber consisting of two electron beam sources, two planar magnetrons, and a rotatable paddle. Separate target control systems provide the precise control and highly repeatable results required for device fabrication. The electron beam systems are capable of precise energy/power control and scanning which greatly extends the unit's capabilities. An Orion-controlled shadow mask assembly enables the precise deposition of multiple layers in a single run, and an FMDS electron microscope is provided for precise substrate dimensional control. 4400's in-set process chamber accommodates various substrate sizes up to 12". The mechanical design features five double-piston-actuated linear motion stages to ensure precise control of the substrate position in the sputtering chamber. A boost-supplied high vacuum pump is integrated into the machine, enabling fast evacuation and maintaining a low base pressure of 5.0 x 10-7 Torr. PERKIN ELMER 4400 offers precise temperature control of the substrate via a closed-loop PID temperature controller. Utilizing a series of temperature probes and a pyrometer, the controller can maintain a set temperature to within 0.15°C. Cooling is achieved by a closed-loop water jacketing tool surrounding the substrate. 4400 also provides a versatile software package for automation and control. The asset is equipped with a 3D graphic user-interface (GUI) for monitoring and controlling the deposition process, providing real-time data on pressure, gas flows, temperature, voltage, and current. With its modular design, the model is capable of complex deposition sequences and enables inter-lockable process steps. All of these features combine to make PERKIN ELMER 4400 an excellent choice for research, development, and production applications. Its superior control and repeatability, combined with its rugged design, makes it the optimal choice for demanding sputtering tasks.