Used PERKIN ELMER 4400 #9066529 for sale

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PERKIN ELMER 4400
Sold
Manufacturer
PERKIN ELMER
Model
4400
ID: 9066529
Metal Sputtering System, 4 - 8" Target System Full Automation System SECS GEM Data Logging Capabilities GUI Software Touch Screen control.
PERKIN ELMER 4400 sputtering equipment is an advanced coating system designed with superior coating performance in mind. It is designed to meet the most challenging requirements of thin film deposition, offering an exceptional level of control and uniformity for a variety of applications. This unit utilizes electrostatic sputtering, which is be used as a physical vapor deposition (PVD) technique. This process is ideal for depositing thin films, such as dielectric, metallic, and composite films, onto a variety of surfaces. It allows for targeted layer thicknesses, defined interface characteristics, and allows for deposition of complex multi-layer films. 4400 has several unique technological advantages that make it one of the most advanced sputtering systems on the market today. For example, the machine includes advanced shielding technology which maximizes the utilization of reactive sputtering processes. This allows for the deposition of high-performance films with a precisely controlled microstructure. Additionally, the tool is equipped with ultra-fast automatic process control that allows for optimized deposition parameters on the fly. PERKIN ELMER 4400 features a variety of process chambers and specialized deposition geometries. The chambers are optimized for a variety of physical and chemical reactions including substrate heating, gas introduction, pressure control, and sputtering control. Additionally, the deposition geometry is precise and uniform, and provides outstanding homogeneity, layer control, and layer thickness uniformity. 4400 is the perfect choice for researchers and production teams who demanded controlled deposition parameters. With its powerful sputtering asset design, excellent uniformity, and easy-to-use technology, PERKIN ELMER 4400 is perfect for a variety of thin-film deposition applications.
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