Used PERKIN ELMER 4410 DC #9183220 for sale

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ID: 9183220
Plasma sputter system P/N: 222-226-310 Gases: O2, Ar, Ni, Si3N4, Cu, Ag, Au, Ti, Si, Ni, SiO3, Al Currently de-installed.
PERKIN ELMER 4410 DC sputtering equipment is a powerful thin film deposition system designed for applications requiring the deposition of thin film materials, such as metals, oxides, semiconductors, and ceramics. It offers a wide range of deposition sources, including direct current (DC) and radio frequency (RF) sputter sources, as well as ion beam sources. The unit is characterized by its robustness and its low operating cost. 4410 DC sputtering machine is capable of depositing thin films of up to 2μm in thickness in a single pass. The tool uses DC or RF sputtering process to deposit electrically conductive, insulating, or semiconductive thin films. This versatile asset can serve applications such as photo masking, medical diagnosis, semiconductor manufacturing, and metrology. The sputtering model uses highly reliable, long-life sputter sources to boost process stability, which is further improved by an efficient turbo molecular pumping equipment for maintaining favorable atmosphere in the chamber. In terms of safety, the system is equipped with dual-mode process safety and emergency shutter. Another attractive feature of PERKIN ELMER 4410 DC is its integrated, easy-to-use process controller. With its intuitive user-defined process control language, users can configure the unit parameters and remotely control it from anywhere. With a maximum base pressure of 2x10-7 Torr, 4410 DC achieves uniformity in thin film deposition. The machine also incorporates advanced external controls, including temperature control accuracy better than 0.1° C/min (with PID closed loop) and thin film rate with a pitch precision ±0.05nm/min. PERKIN ELMER 4410 DC sputtering tool is an ideal solution for applications requiring high-precision, high-speed, and cost-effective thin film deposition. Its reliable, robust design and superior performance makes it an ideal choice for industrial thin film deposition applications.
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