Used SHIBAURA CFS-12P-100H #32091 for sale

ID: 32091
Wafer Size: 3"-6"
Vintage: 1997
Coating system, 3"-6" Batch type Al2O3 Deposition system RF Soft etching Temperature: 200°C (3) Targets, 8" Deposition: 5 kW RF Generator Bias: 1.5 kW 1997 vintage.
SHIBAURA CFS-12P-100H is a state-of-the-art etcher/asher which allows users to achieve superior etching and ashing results by using a combination of specialized plasma, gas and thermal processing techniques. CFS-12P-100H is capable of producing both isotropic and anisotropic etching and ashing of a wide range of materials, including silicon, glass, ceramic, and metal. The unit is designed for direct mounting in either a Class 100 or Class 1000 cleanroom and its performance has been tested for a production rate of 100 pieces per hour. The unit's process chamber is constructed of stainless steel, and equipped with a sealed vacuum chamber, a quartz tube/ Cathode, a Heater, and a quartz plate. Additionally, a unique double-seal design prevents contamination between chambers, while the advanced RF power delivery equipment allows for accurate control of the input power throughout the process cycle. The annealing and cleaning system uses a ceramic heaters and an integrated heat exchanger to to provide precise temperature control and elimination of thermal overshoot. SHIBAURA CFS-12P-100H is also equipped with an advanced variable RF power delivery unit, providing superior control of the output power, while a unique dual-cavity plasma machine allows for maximum depth of etch and low-temperature operation. CFS-12P-100H is also compatible with a variety of gases and chemicals, making it ideal for a wide range of etching and ashing applications. The unit has been designed for safety and reliability, featuring multiple safety devices to protect the process chamber, RF generator, and user from possible hazards and an integrated automatic shutdown in case of emergency. Overall, SHIBAURA CFS-12P-100H is an advanced etcher/asher designed for superior etching and ashing performance, allowing users to achieve results of the highest quality in the safest manner.
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