Used TECPORT Cantata #9124385 for sale
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ID: 9124385
Ion Beam Sputtering (IBS) System
3-Grid RF Beam
Control interface
Vacuum chamber: Symphony 8; 800mm W x 800mm D x 700mm H
Frame assembly: Tecport with duct system
Rotation system: planetary, (4) 88mm diameter substrate holders
Substrate heater: Eurotherm, SCR halogen heater
Temperature controller: Eurotherm 2408 PID programmable
High vacuum pumping system: Helix CTI OB 320 cryopump with 9600 compressor
Low vacuum pumping system: Edwards
Vacuum gauge controller: Granville-Phillips 307
Vacuum gauge: Granville-Phillips: (2) convectron gauge, (1) tubular ion gauge
Optical monitor system: Intellevation IL 550 Series
RF ion source: KRI 14cm RF ICP gridded ion source package
Target assembly: Tecport, (3) 12" assemblies with automatic indexer
Ion source: KRI EH400HC with hollow cathode electron source
Rack system: Tecport
UPS: MGE Pulsar Extreme M22000RT-2U
Computer: Dell PowerEdge 2950
Touch screen: (2) 15" ELO Intellitouch
Keyboard and mouse
PLC: Allen-Bradley ControlLogix 1756
Kiosk stand: Tecport
(5) MFC: (2) RF ion source, (2) End-hall ion source, (1) HCES
Auto pressure controller: Apex
Shields: Tecport
Software package: Symphony OPUS
Load lock package: Tecport.
TECPORT Cantata is a state-of-the-art sputtering equipment designed for industrial applications. It consists of powerful vacuum deposition technology that allows for the deposition of thin films to a wide range of substrates. The system's compact design allows it to fit in many production areas and provides easy access to its components. Cantata sputtering unit is comprised of a vacuum deposition chamber, evaporation sources, a turntable, process controls, and a vacuum pumping machine. The vacuum tool consists of a fore-vacuum chamber, a primary vacuum chamber, and a load lock. The evaporation sources are made from ceramic or quartz crucibles and can be outfitted with up to three targets. The turntable allows several substrates to be simultaneously processed, greatly increasing productivity. TECPORT Cantata's advanced process control asset provides precise and consistent deposition rates, resulting in consistently high quality parts. The model is capable of depositing several layers of material onto substrates, including aluminum, gold, and various oxide layers. The resulting parts from Cantata equipment have excellent electrical and optical properties, making them ideal for a variety of applications. TECPORT Cantata sputtering system is also extremely easy to operate. It utilizes a user-friendly touchscreen interface, allowing operators to quickly set up and run their deposition process. The unit also features a variety of diagnostic tools, allowing operators to monitor processes in real-time and make any necessary adjustments. All of these features make Cantata an ideal solution for almost any industrial vacuum deposition application. TECPORT Cantata sputtering machine is designed to provide a reliable, repeatable and efficient deposition process. Its advanced features, combined with its compact size, make it perfect for both large-scale and small-scale production. With its powerful vacuum deposition technology, Cantata provides operators with a versatile and cost-effective solution for their industrial applications.
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