Used ULVAC Ceraus Z-1000 #9051782 for sale

ULVAC Ceraus Z-1000 sputtering equipment is a high-performance tool used in the physical vapor deposition of metal and other thin films. The sputtering system utilizes advanced thin-film deposition technologies to achieve precise thin-film deposition with excellent repeatability and high deposition ratio, featuring superior uniformity and thickness performance with low tool-to-tool variation. The unit is composed of three 2 chambered systems that allow for independent operation and up to six differential pumping nodes to achieve excellent vacuum performance. In addition, Ceraus Z-1000 machine has dual-process capability to enable two deposition processes to be conducted simultaneously, with up to 12 sputtering sources available. ULVAC Ceraus Z-1000 tool is equipped with a Grounded Cathode Plane (GCP) technology which is an innovative in-situ control for electron bombardment assisted sputtering. The GCP technology ensures optimal substrate biasing and superior uniformity control. The asset is designed for semiconductor deposition, including dielectrics, metals, polyconstrained materials, and passivation layers, among other layers regularly used in the semiconductor productions. It comes with several user-friendly features, such as automated recipe control, dual-chamber sputtering capability, and easy-to-use process control. A variety of control functions and operations can be configured with the user-friendly software. These include repeat run, recipe setting, temperature and gas control, and rate monitoring & feedback. This allows for superior control of the deposition process. Ceraus Z-1000 model is also capable of uniform thin-film deposition and coating, as well as advanced 'in situ' monitoring of the deposition process to ensure high-quality results. A side-wall sputter source with a highly uniform angle of deposition assists in the uniform uniformity of the thin-film across wafers. ULVAC Ceraus Z-1000 is designed for demanding semiconductor process applications, and it delivers top-notch performance with impressive repeatability. It offers advanced features needed for reliable thin-film deposition in the sputtering process, which makes it a highly reliable tool.