Used ULVAC Ceraus Z-1000 #9133008 for sale

ULVAC Ceraus Z-1000 is a high-performance sputtering equipment that enables engineers and scientists to create thin films with precise control. The system employs the latest technology in sputtering deposition and ionic bombardment techniques to ensure uniformity on a variety of substrate materials. Ceraus Z-1000 is designed to enable maximum control of sputtering parameters by providing thorough operational insight and user configuration. It enables sputter sources to rotate to allow the deposition of uniform coatings even with complex shapes of samples. The unit's high deposition rates and precision synchronization increase deposition time, while its adjustable power capabilities and low-disturbance architecture enable extremely precise films. The machine includes a high power, low noise source capability, along with an integrated vacuum pump and cryopumping technology. This allows for operators to deposit different layers at different vacuum levels and with minimal noise. ULVAC Ceraus Z-1000 also includes a patented low pressure arc discharge source and adjustable shutters in its high-end deposition chamber. This enables the deposition of different metals using a variety of sputtering techniques such as ion beam, plasma, bias and reflex assisted sputtering. ULVAC Ceraus' closed-loop ion source control offers accurate uniformity over all targets and substrates with its advanced ion beam current monitoring and predictive control technology. This also ensures minimal contamination even with heavy deposition rates. With its vacuum and cooling capabilities users can precisely control all sputtering parameters to create thin films with great uniformity and repeatability. Ceraus Z-1000 is the perfect choice for creating precise thin lms with a high level of control. Its exact control over sputtering deposition processes coupled with its reliable ion source, cryopumping, and adjustable shutters guarantee uniformity on a variety of substrates. The tool's low pressure arc discharge source also guarantees accurate uniformity over all targets and substrates. This makes it an ideal solution for creating thin films with exact control and precision.