Used ULVAC Ceraus ZX-1000 #9012938 for sale

ULVAC Ceraus ZX-1000 sputtering equipment is designed for depositing thin films for various applications. Using the process of sputtering, an inert gas such as argon is ionized, allowing particles to be ejected from the target material and collect on the substrate. The sputtering system can be used to deposit different materials such as metals, semiconductors, insulators and transparent conductors. ULVAC CERAUS ZX 1000 sputtering unit consists of a deposition chamber, two sputter guns, two magnetrons, a deposition chamber exhaust and vacuum related components. The two sputter guns are separated on opposite sides of the deposition chamber and feature three 170mm biasable targets, one cylindrical magnetic filter and a quartz window to view the process. This allows for dual deposition of different materials and the magnetic filter eliminates any micron particles from the deposition. The two magnetrons are controlled to adjust the power of the sputtering process and the deposition chamber exhaust is capable of evacuating the chamber within a short time period. Ceraus ZX-1000 sputtering machine uses a DC Magnetron power supply to ionize the argon gas and a substrate heater for pre-heat treatment. The substrate heater is also used to maintain a higher substrate temperature with improved film properties. The controlling software of the tool allows users to monitor and adjust process parameters as needed. CERAUS ZX 1000 sputtering asset provides reliable and uniform films with reproducible properties. This model is ideal for sputtering substrates with large area and high throughput of small substrates. The robust design and the use of MF power sources provide a stable and efficient operation of the equipment. The system offers superior control of the process parameters, providing excellent uniformity and high film reproducibility. ULVAC Ceraus ZX-1000 sputtering unit is suitable for research and development as well as production applications.