Used ULVAC Entron #9082796 for sale

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ULVAC Entron
Sold
Manufacturer
ULVAC
Model
Entron
ID: 9082796
Wafer Size: 12"
Vintage: 2007
Sputtering system, 12", 2007 vintage.
ULVAC Entron is a high-performance sputtering equipment used for depositing thin films with excellent optical, electrical and mechanical properties. It has been specifically designed for use in the semiconductor industry and other fields that require high-quality thin films for their products. Entron consists of two main components: a sputter gun and a deposition chamber. The sputter gun works by launching energetic ions directly at a material target, causing atoms of the target material to be displaced and separated from the target surface and deposited on the desired substrate. This process is referred to as physical vapor deposition (PVD). The deposition chamber provides the necessary environment for proper target selection, process conditions and uniformity of the material film. The system also includes a number of other features that improve the quality of the thin films, such as an adjustable beam spot size and an adjustable beam energy. The adjustable beam spot size allows the user to select the size of the individual particle deposition, while the adjustable beam energy can be controlled to optimize the film's uniformity and adhesion characteristics. The unit can also be equipped with an optional furnace to heat the target and the substrate in-situ. ULVAC Entron is a powerful and reliable machine that can perform a variety of complex processes, such as multiple layered films, films of different thicknesses or films of different materials. It is outfitted with several control systems that allow for maximum process automation and control, ensuring the repeatability and reproducibility of the process. Entron is a highly advanced tool that comes with a range of customizable features, allowing users to tailor their sputtering asset to meet their specific requirements. Its highly efficient, low-temperature ion bombardment process ensures the deposition of high-quality thin films and is perfect for both commercial and industrial processes. With its advanced features, it is an excellent choice for anyone looking to achieve superior thin film results.
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