Used ULVAC MLX-3000N #9273662 for sale

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ULVAC MLX-3000N
Sold
Manufacturer
ULVAC
Model
MLX-3000N
ID: 9273662
Wafer Size: 5"
Sputtering system, 5" (3) Chambers.
ULVAC MLX-3000N is a dual magnetron sputtering equipment, used for thin film deposition in semiconductor and optoelectronic device manufacturing. It offers a high-speed, digital-controlled hybrid sputtering system, capable of depositing metal, oxide, nitride and alloy films on various substrates. MLX-3000N is equipped with two target sources: a high-powered, DC magnetron sputtering source, and a medium-powered, RF sputtering gun. Each source can be independently operated, allowing for a variety of deposition methods. An advanced film thickness monitor is included, enabling precise thickness measurements to be taken during the sputtering process. Additionally, ULVAC MLX-3000N features a high-speed wafer shuttle, allowing for quick loading and unloading of up to 4 wafers at a time. The unit has a highly flexible source configuration, allowing for various target materials and substrate sizes to be used. The DC magnetron source offers excellent deposition rates and good film quality. It is equipped with an electrode power supply, allowing for high precision control of film deposition, as well as precise control over the oxygen rate in the deposition chamber. Additionally, the RF sputtering gun is designed for deposition of small and/or thick films. In addition to film deposition, MLX-3000N also provides a comprehensive range of plasma processes, including etch, impurity gettering, cleaning, surface passivation and other surface treatments. The machine is equipped with an advanced etch controller, allowing for high quality, precision etching of all types of materials. Additionally, it can be used for photo-induced processes, such as LED and OLED device fabrication. Overall ULVAC MLX-3000N is a cost-effective, high-speed hybrid sputtering tool, ideal for semiconductor and optoelectronics device manufacturing. It offers high-speed, versatile deposition, giving manufacturers the ability to produce thin film layers with optimal uniformity and quality. Furthermore, its comprehensive plasma processing capabilities make the asset suitable for a wide range of applications.
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