Used ULVAC Z-1101 #293610445 for sale
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ULVAC Z-1101 is a highly efficient sputtering equipment used for various coating applications. This system utilizes a high-frequency, high-power impulse sputtering process that utilizes a high-power magnetic field to generate a high-density plasma. Z-1101 is capable of depositing a wide range of sputtering materials including titanium, aluminum, stainless steel, and copper. ULVAC Z-1101 is a single-chamber, multi-target sputter deposition unit with an approximate chamber size of 16" × 16" × 16". The deposition chamber includes a heated secondary electron emission (SEE) dome, an exhaust line and two top-loading quartz cassettes that can be used for wafer transport. Z-1101 machine is equipped with a high-density, high-power power supply module, an RF sputter generator, an Automatic Pressure Controlling (APC) tool, and a water-cooling unit. ULVAC Z-1101 employs a magnetron sputtering process providing high-density plasma and superior sputtering performance. The power supply module is designed with a high-power density of 0.5 kW/in3 and a homogeneous magnetic field of 3.5 Tesla. The RF power is adjusted between 0 and 15kWatts to provide maximum sputtering performance and excellent coverage. The RF generator is equipped with an automatic frequency tuning asset, allowing the process to target multiple sputtering materials. Z-1101's high reliability and precision make it highly sought after for its repeatable and passivating results. Its digital display ensures accurate process control and monitoring of the process parameters at all times. The model features a powerful embedded controller with a user-friendly interface and a process database allowing for easy equipment parameter modification. This sputtering system also offers uniform exposure of the materials, which can be beneficial to reduce the size of the mask and shadowing effect. Additionally, a multi-target unit enables optimum coverage with large-area uniform sputtering as compared to a single-target unit. ULVAC Z-1101 also offers a wide range of process capabilities, including layer-by-layer deposition, ion-assisted deposition, reactive sputtering, and titanium oxide deposition. Z-1101 is an excellent choice for industries requiring precision coating applications and can be used in automotive, display, electronics, flat panel and magnetic storage media industries. This machine is capable of achieving high deposition rates, enabling a fast production process and increased throughput.
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