Used ULVAC Zi-1000N #9156833 for sale

ULVAC Zi-1000N sputtering equipment is a versatile, high-performance tool for thin film deposition. It is capable of producing ultra-high vacuum (UHV) conditions and operating at a pressure of less than 10-6 Torr. The system includes a powerful DC power source, making it capable of sputter deposition at high rate of speed. It also has a large chamber with a diameter of 1000 mm / 39.37 in and a maximum height of 600 mm / 23.62 in, and can easily accommodate large substrates up to 4 inch wafers. Zi-1000N utilizes a high power DC sputtering gun with multiple configurations. It is uniquely designed with a two arc unit that provides uniform deposition over a large area. The sputter gun is also designed to minimize arcing at lower power parameters. This makes it ideal for applications requiring low to medium power deposition. ULVAC Zi-1000N is capable of performing multiple thin film deposition processes. It is equipped with an integrated heating machine and is capable of supporting temperatures up to 300 degrees Celsius. The tool can also perform chemical vapor deposition (CVD) and plasma enhanced chemical vapor deposition (PECVD). The asset also utilizes a precision robotic arm that improves accuracy and speed of substrate handling. This allows for precise process control and repeatable results. Zi-1000N also includes a base-plate centered large-diameter DC sputtering source and a heater element that covers the full area of the substrate. This makes it ideal for coating of multiple substrates simultaneously. ULVAC Zi-1000N offers reliable, consistent, and repeatable thin film deposition. It is easy to maintain and user-friendly. The sputtering model is designed with a sleek, modern look, with a transparent chamber and touch-screen panel for clear visibility and simple operation. With its advanced sputter deposition capabilities and easy to use control equipment, Zi-1000N is the perfect solution for thin film deposition needs.