Used UNAXIS / BALZERS LLS 502 #9214750 for sale

UNAXIS / BALZERS LLS 502 is a high-performance sputtering equipment designed to deposit thin films onto substrates. It is suitable for industrial-scale production of a variety of thin film materials and can deposit films from one or multiple targets. The system includes a sputtering chamber with an ultra-high vacuum of 2 x 10-6 mbar, a temperature range of 150°C to 350°C and a maximum working distance between the plasma and the substrate of 360mm. Films can be deposited directly on top of the substrate or onto a target chuck. The unit also includes an automated multi-zone process control with manual and automatic deposition recipes. UNAXIS LLS 502 is powered by a medium frequency source with a maximum power of 6kW which provides a stable, uniform deposition rate. It incorporates a full evacuation machine including an oil-free mechanical dry pump, a turbomolecular pump for pre-evacuation, four diffusion type pumps and a set of cry pump valves. The control software ensures precise process control including cathode bias voltage, sputtering gas pressures and temperature. It also includes a recipe editor for the user to configure a bespoke process with correct parameters. To ensure repeatability the tool is fitted with an automatic planarity control asset. BALZERS LLS 502 can be used for a variety of film deposition techniques such as PVD (Physical Vapor Deposition), magnetron sputtering, ion beam deposition, and reactive sputtering. It is suitable for a variety of application such as semiconductor devices, microelectronic devices, dielectric layers, metallization layers, ITO layers, multilayer stack deposition, MEMS, thin layers for optics and displays, multi- targets and multi-material systems, and magneto-optical thin film production. The model is designed for reliable and repeatable production of high-quality thin films suited to various research and industrial applications. It is a versatile deposition equipment with a range of features and is perfect for any kind of thin film deposition process.