Used UNAXIS / BALZERS LLS 502 #9254074 for sale

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ID: 9254074
Sputtering system.
UNAXIS / BALZERS LLS 502 is an advanced ion sputtering equipment used in the deposition of thin films for semiconductor, optical, and medical applications. This system offers unique advantages to manufacturers, such as high uniformity, high deposition rate, and compatibility with a range of substrates. UNAXIS LLS 502 sputtering unit consists of an RF power supply, an ion source, and a chamber that contains a source target, vacuum pumps, and a viewing/sample holder. The RF power supply is used to power the ion source, which consists of one or more magnetron sputter cathodes coupled with an ion gun and laser for ion beam control. The chamber has a tungsten crucible-like source holding target and multiple pumping ports. The view/sample holder has two indexable sample supports, as well as windows for viewing the deposition process. The ion source is used to create a plasma of argon or other reactive gasses, which is fed into the deposition chamber. The ion source produces positive ions of the source material by sputtering bombardment and ion extraction. An adjustable bias voltage allows for precision control of the ion current density and the angle at which the ions strike the substrate. TheView/Sample holder undergoes 180° of rotation while being simultaneously pre-heated and exposed to the sputtering process. A cooled high efficiency magnetron gun target provides a large sputtering area, allowing for higher deposition rates while maintaining uniform thin film deposition. BALZERS LLS 502 is designed to accommodate substrates from a range of sizes and materials. The substrate geometry is automatically adjusted and indexed for each individual substrate. It also offers an adjustable deposition rate, which allows for precise control of the material being deposited on the substrate. LLS 502 sputtering machine provides versatile deposition of thin films for a wide range of applications. Its specialized design guarantees uniform film deposition, high deposition rates, and compatibility with a range of substrates. This advanced tool is a reliable option for manufacturers in the semiconductor, optical, and medical industries.
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