Used UNAXIS / BALZERS LLS EVO #9254147 for sale

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ID: 9254147
Sputtering system Simatic Programmable Logic Control (PLC) with profibus Cryo pump RF Power supply.
UNAXIS / BALZERS LLS EVO is a vacuum sputtering equipment that is widely used in research and production applications. It is a robust, reliable and easy-to-use tool that can be used in various sputtering processes such as ion beam sputtering (IBS) or magnetron sputtering (MS). UNAXIS LLS EVO is a multi-substrate sputtering tool that offers a variety of sample processing capabilities. It is equipped with two high-vacuum chambers and a versatile cathode design which allows for low-duty cycle sputtering of both standard and large-format substrates. The chambers have a working pressure range of 10-6 mbar and can be used for precious-metal or insulator-sputtering. The chambers feature a high-quality membrane pump which enables users to reduce their maintenance costs. BALZERS LLS EVO is a self-contained system which includes a loading-unloading robot, a substrate dock, a process controller, and a high-precision linear motor. The robot provides fast motion and precise positioning of substrates while the dock allows for convenient storage of multiple substrates. The process controller ensures that all sputtering parameters are properly set and provides users with easy-to-use graphical user interface. The linear motor ensures that the substrates move at the correct speed to ensure the desired deposition thickness. LLS EVO utilizes a uniform gas flow unit to ensure that uniform deposition is obtained across the entire substrate. The machine also features advanced process monitoring technology which enables users to observe deposition process in real time. Additionally, the tool has automated recipes for different sputtering processes as well as the ability to save individual settings and recipes. UNAXIS / BALZERS LLS EVO is widely used in both research and production applications due to its versatile design and wide range of processes. It is suitable for a variety of substrates from small wafers to large rectangular and curved substrates. The asset can also be used to produce films, coating, and thin films of various materials such as gold, aluminum, and titanium. In conclusion, UNAXIS LLS EVO is a reliable and robust sputtering model that can be used in a variety of sputtering processes. It offers a wide range of capabilities and is suitable for a variety of substrates. With its advanced process monitoring technology and self-contained design, it is an excellent option for both research and production applications.
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