Used UNAXIS / BALZERS LLS EVO #9259021 for sale

UNAXIS / BALZERS LLS EVO is a magnetron sputtering equipment that is commonly used within the semiconductor industry in a variety of deposition processes. The system is composed of a sputter chamber, target material sources, and several other components. The sputter chamber itself is a vacuum chamber designed to hold a range of substrates including wafers and other devices. These substrates are loaded onto a special vacuum wafer boat platform that sits inside the chamber. This is necessary for the deposition process to take place in a uniform fashion. The sputter chamber also houses the magnetron sputtering systems. This is what allows the target material sources to be deposited onto the substrate surfaces. A high voltage source is used to create an electric field that interacts with the gaseous ions present in the sputtering chamber. This then causes them to bombard the targeted sputter material which then gets propelled from the material's surface onto the substrate. UNAXIS LLS EVO has advanced features such as the reactive chamber feature which allows the use of a gas mixture to sputter and process certain materials. This type of process is ideal for achieving specific stoichiometric ratios and creating technically demanding materials. The unit also features an integrated laser machine that can measure the thickness of the deposited films in real time. This lighting tool also serves as a diagnostic tool and a asset monitor. BALZERS LLS EVO is designed for high through-put usage and can process up to 12 wafers per hour. It also has a touch screen panel for easy operation and parameter settings which allow the user to tailor the sputtering process to their specific needs. The model is outfitted with a variety of features designed to enhance the user experience such as a user friendly screen, efficient process control, and powerful software. LLS EVO equipment is a reliable and effective deposition system that can help meet the demands of the semiconductor industry. It can provide users with advanced and precise deposition processes that will help increase production throughput and yield. The unit's integrated features also allow for greater process control and tailoring, making it a great solution for a variety of deposition needs.