Used UNAXIS Clusterline 200 #9279527 for sale

UNAXIS Clusterline 200 is a state-of-the-art PVD sputtering equipment that offers superior process precision and repeatability. Clusterline 200 is based on a modular design concept consisting of a loadlock chamber, a single- or dual-sputter source, and a process chamber. This allows the system to configure a variety of deposition processes such as dc or pulsed dc/rf magnetron sputtering, electron and ion beam evaporation, and chemical etching. The unit utilizes a low-maintenance ultra-high vacuum of up to 8x10-8 mbar, enabling very accurate process conditions for various thin film applications. The controller, which operates on an advanced real-time GUI, provides users with multiple process control options and ensures precise process control in manual or automatic modes. The software also allows users to quickly and efficiently troubleshoot sputter deposition processes on their own. UNAXIS Clusterline 200 is an automated-batching sputter machine, featuring a compact loadlock combination with built in batch transporter. This allows users to process substrates up to 8" in size simultaneously, while only needing a small footprint. The tool also offers various other platen options for multi-zone or single-chamber operations. In addition to its precise process control capabilities, Clusterline 200 features high-resolution integrated viewing cameras and power supply monitors. The offering of modular gas systems allows for the control of various inlet and exhaust gasses, enabling excellent film quality with precise control and repeatability. UNAXIS Clusterline 200 provides users with a comprehensive and reliable PVD asset that is equipped with an advanced sputter source option, an automated-batching capability, and a multitude of built-in features. The accessible reliability and the scalability of the model make it a preferred choice in various sputter deposition industries.