Used VARIAN 3120 #9258459 for sale

VARIAN 3120 is a DC magnetron sputtering equipment designed to deposit layers of metals, dielectrics, and semiconductor materials. The sputtering system includes a vacuum chamber, an end-Hall magnetron source, two flood gun sources, three gas mixers and a target inflator for controlling substrate temperature. The vacuum chamber is made of stainless steel and has a dimension of 600mm in diameter and 800mm tall. It has a gate valve assembly and includes a window for substrate observation. It has two pumps, a turbomolecular pump and a mechanical pump, for creating a high-vacuum atmosphere. The turbomolecular pump provides a sustained pressure of 2x10^-5 Pa, while the mechanical pump provides a base pressure of 3x 10^-7 Pa. The target inflator is used to regulate substrate temperatures, allowing the user to set a substrate temperature between 0 and 200°C. It uses a precision heater, an embedded temperature sensor, and a temperature control unit. The end-Hall magnetron source is used to sputter film material onto a substrate. It has an inverter-coupled design, which allows an optimized power supply for stable sputtering process with the highest resolution. The end Hall magnetron enables variable power up to 2,500 watts and operates at a sputtering pressure of 2x10^-2 mbar. Two E-beam flood guns are provided for metal sputtering and deposition. They are electronically controlled and use tungsten filament as source material. The filament can provide up to 8,000 Volts of power, enabling uniform deposition of thick layers of metal and dielectric material. The three gas mixers provided with the machine enable a continuous supply of gas for reactive sputtering processes. The gas mixers are capable of supplying the chamber with Argon, Oxygen, and Nitrogen. This allows the user to create a variety of different reactive sputtering environments. 3120 sputtering tool provides the user with a reliable and precise tool for metal and dielectric deposition processes. It is easy to operate, allowing users to quickly set up and adjust processes. The asset uses advanced technology to provide consistent, high-performance deposition at cleanroom-level quality.