Used VARIAN 3180 #143941 for sale

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VARIAN 3180
Sold
Manufacturer
VARIAN
Model
3180
ID: 143941
Wafer Size: 5"
Sputtering system, 5".
VARIAN 3180 is a sputtering equipment designed to deposit thin film layers onto substrates with the highest achievable purity and uniformity at high deposition rates. It offers a comprehensive range of features, including both DC and radio frequency power supply configurations, digital thickness control, and active or passive substrate cooling. With a wide range of process gases and several internal gas delivery systems in a temperature controlled enclosure, it is capable of operating in both Planar Magnetron and Triode configurations. 3180 also has several unique features, including remote monitoring and diagnostics capabilities, dual sources with simultaneous deposition, and automatic web-based data storage. This sputtering system is also able to utilize a wide variety of power sources and process gases, including a powerful 150 kW DC power supply and a 260 kW RF power supply. In addition to its advanced power supply systems, VARIAN 3180 also employs an advanced control software program that enables precise control over the deposition process. The unit has ten process gas input points and built-in independent controllers for each gas type. This enables precise control of process parameters and by utilizing multiple gas types, the machine can easily deposit multiple layers at once. The software also captures and monitors vital data in real time, enabling easy data trending and analysis. The tool also includes a range of sample loading systems, including an integrated linear conveyor, a shuttle loader, a high-density sample storage asset, and a unique sample routing model. It also offers precise temperature control, with temperatures capable of being adjusted to precise accuracy within 10 microns. 3180 sputtering equipment provides a versatile, efficient and high-throughput solution for thin film deposition needs. By providing a choice of power supplies and by offering several inboard deposition sources, accurate process control and precise substrate temperature management, this system ensures the highest quality deposition results. Furthermore, advanced diagnostics and remote monitoring capabilities allow for easy and accurate process analysis from any location.
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