Used VARIAN 3180 #156923 for sale

VARIAN 3180 is a sputtering equipment designed for a variety of unique materials processing and deposition applications. This system consists of a source, two power supplies, two process chambers, two rotating targets and a variety of optional components. The source is an arc sputter ion source, which is capable of depositing conducting and non-conducting materials including those that are highly sensitive and require a bias, different pressure ranges and greater power levels. This unit also has the ability to handle pulse operations, dc or ac operation, pulsed and resistive substrate biasing. The power supplies come in regular and high voltage models, and can deliver up to four kV and 25 mA respectively. The two process chambers are connected to the source, each with an individual gas line for pressure control and separate process connections for vacuum, safety and gas control. They allow processing and deposition of materials such as chromium, carbon, tungsten, and other materials with interlayer systems, multilayers and virtually any combination of elements. Each chamber has the capability to operate either single substrate or multiple substrates at the same time, and can be used in either batch or inline mode. The targets are installed in each of the two process chambers and rotate on their own axis in order to increase the uniformity of the deposited material. This machine has extremely fast sputtering rate and can even deposit very thin layers of materials. 3180 Tool also has multiple additional options available, such as crystal monitors, multiple sample holders, and a suite of vacuum-related measuring and control systems. The overall sputtering rate of the asset is extremely numerous, with very thin layers of a wide varieties of materials being achieved. The whole model is also very easy to use, with user friendly interface and flexibility for changeovers between deposition processes. Overall, VARIAN 3180 sputtering equipment offers a robust and reliable platform for the deposition of a wide range of materials. The variety of advanced features make it extremely reliable, allowing the system to be used for a variety of mission critical applications.