Used VARIAN 3180 #69386 for sale

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VARIAN 3180
Sold
Manufacturer
VARIAN
Model
3180
ID: 69386
Wafer Size: 4"
Sputtering systems, 4" Throughput: 60 wafer/hr for 1 micron aluminum alloy deposition, independent of water size Film thickness uniformity, 100mm: +/-5% across wafer for aluminum alloys excluding out 0.0625" of water Film thickness uniformity, 125mm: +/-6.5% across wafer for aluminum alloys excluding out 0.0625" of water Vacuum system: Deposition chamber: Varian Cryostock-12FA closed-loops helium pump, 12" Load lock: 14cfm Deposition source: Type: close-coupled dc conical Magnetron Orientation: vertically mounted for sideways sputtering Deposition rate: ~12,000A/min Cathode: 7" dia., annular Cathode life: 2000 one-micron Deposition DC power supply: 12kW Operating Crated.
VARIAN 3180 is a high-performance sputtering equipment that provides optimal coating performance for a wide array of applications. The system is composed of a DC magnetron sputter unit that is capable of achieving high deposition rates up to 180nm/min as well as excellent coverage. Sputter coating is a process that involves high-power direct current (DC) magnets, a deposition chamber, and a vacuum machine. The magnetron sputter tool provides ultimate control over the characteristics of the deposit such as thickness and surface quality. 3180 is controlled by the PLCDAQ software that is capable of controlling all the processes within the asset. The software also allows the user to select the source materials, chamber geometry, process cycle, and all other parameters of the sputter-coating process. In addition, the software can store all the recipes used in the model in order to facilitate a faster startup time and increase user convenience. VARIAN 3180 is comprised of several components that are important for effective sputter coating. For instance, the chamber of the equipment is equipped with a long-life liner, which offers superior protection against contamination, wear, and physical damage. In addition, the chamber offers superior gas tightness and is able to accommodate both atmospheric and high-vacuum processes. The chamber provides an exceptional level of uniformity, allowing for the uniform coating of a substrate with no shadowing effects. The RF driven ion-beam sources provide substrate heating that is uniform and at a higher rate than thermal evaporation. The High-Voltage-driven RF powered ion source is even more capable of increasing the deposition rate. The sputter source can also be adjusted to ensure improved ion bombardment of the target material, resulting in improved performance and higher quality of the sputter coatings. 3180 offers a wide range of advantages that makes it a superior sputtering system. It provides excellent coating performance with superior coverage, a reliable and stable operation, and superior speed and uniformity. In addition, the unit is highly customizable and capable of accommodating a variety of chamber geometries and source materials. As such, VARIAN 3180 is ideal for a range of industrial and scientific applications, providing the necessary reliability, speed and accuracy for superior coating performance.
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