Used VARIAN 3190 #9184622 for sale

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VARIAN 3190
Sold
Manufacturer
VARIAN
Model
3190
ID: 9184622
Wafer Size: 5"
Sputtering system, 5" Module: Metal Process: Metal deposition Front-metal (RF +Ti +NiV +Au).
VARIAN 3190 is a high precision sputtering equipment that is designed for the deposition of ultra-thin film layers onto a wide range of substrates. It is mainly used for the fabrication of optoelectronic devices such as semiconductor chips, flat panel displays, and solar cells. The sputtering system works by using a process involving a magnetron cathode, which is mounted on the top of the vacuum chamber. This magnetron cathode is energized by an alternating current (AC) power supply and bombards a target material with energetic ions. This bombardment causes the target material to sputter, ejecting positively charged ions which are then attracted to the substrate placed in the vacuum chamber. These ions deposit onto the substrate, forming a thin film layer. 3190 offers many features that make it ideal for thin film deposition. The electronic control unit allows for precise programming of the sputtering parameters such as power, duty cycle, deposition rate, and pressure. The machine also features a high-precision shutter mechanism for the precise closing and opening of the vacuum chamber. This feature is important for the uniform and consistent deposition of the thin film layers. VARIAN 3190 offers a variety of sputtering configurations, allowing the user to incorporate different types of substrates and target materials into the deposition process. The tool can be configured with a single magnetron cathode, or multiple magnetrons can be used in a stacked configuration. The sputtering process can be further enhanced by the addition of an external magnetic field, allowing the user to tailor the direction of sputtered ions to create more uniform films with fewer defects. 3190 asset is a reliable and user-friendly sputtering model. It is easy to use, and provides excellent uniformity in thin film deposition. It is ideal for the fabrication of a wide range of optoelectronic and other devices, and is capable of depositing films with excellent stability and performance.
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