Used VARIAN 3190 #9184623 for sale

VARIAN 3190 Sputtering Equipment is a high-throughput PVD system designed to produce surface coatings and thin films of consistent high quality and grade. This unit is ideal for any application that requires precision surface treatment. 3190 uses a two-chamber, dual-source vacuum machine. The process chamber is typically held at a base pressure of 10-6 mbar. The deposition side of the tool consists of a load-lock and the sputter source chamber, equipped with a shutter-controlled resistive ion beam source (RIB). The RIB contains a pulsed-dc magnetron sputtering source and allows for module loading and unloading. Additionally, VARIAN 3190 is equipped with a high-frequency, low-energy ion source for reactive ion etching (RIE) of the deposited material. The substrate temperature in 3190 is adjustable from room temperature up to 500ºC. It also features a vacuum-controlled gas injection asset for gas-dynamic etching of the surface treated, further enhancing the functional capabilities of the model. Not only is VARIAN 3190 capable of generating highly uniform thin-films, but its modular design allows for rapid material changeover. This allows for precise repeatability and optimized throughput within a small footprint. Additionally, 3190 is equipped with an in-situ mass spectrometer for end-point detection, ensuring that deposited layers are consistently high-quality and consistent through the sputtering process. In conclusion, VARIAN 3190 is an advanced PVD equipment capable of producing ultra-high quality surfaces and micro-layers of materials. Its gas-injection system, RIE source, and in-situ end-point detection all contribute to higher process stability and repeatability.