Used VARIAN 3190 #9198796 for sale

VARIAN 3190 is a state-of-the-art, ultra-high vacuum (UHV) preparative sputtering equipment used for creating thin films and/or targets for use in a variety of scientific research applications. This high-tech instrument is designed specifically for the deposition of conductive, protective, or insulating thin films or targets onto semiconductor, metallic, insulating, or optically transparent substrates. 3190 is an advanced sputtering system that utilizes two independent flexible sputter sources, up to four sample-in-vacuum stages, and a comprehensive software package to accurately and reliably create thin films and/or targets. The two independent sputter sources allow for multiple simultaneous processing of multiple samples, facilitating large batch processing. The four multi-zone sample-in-vacuum-stages are each equipped with a turbo-water pump, a 130 l/s turbomolecular pump, a mechanical fore pump, and multiple gas sources for chamber conditioning and process control. Furthermore, VARIAN 3190 includes a comprehensive suite of software options to enable precise process control and data gathering. Featuring a highly flexible command set, the unit's software can monitor and adjust multiple exotic process parameters such as evaporation temperature, gas pressure, sputter power, sputter rate, and more. The software also allows for precise spatial control of the sputter sources, as well as processes that use alternating sputter guns, making complex shadowing and doping processes possible. In addition, 3190 provides a variety of safety measures including interlock circuits, alarms, and pressure and temperature sensors to ensure safe, reliable operation of the machine. Finally, the high UHV environment ensures the accuracy of the process, providing an optimal setting for the deposition of thin films or targets. In summary, VARIAN 3190 is a state-of-the-art sputter tool designed to deposit thin films and/or targets efficiently and reliably. Its two independent sputter sources, four multi-zone vacuum stages, and comprehensive software package make it a powerful tool for research applications. Furthermore, the safety measures, high UHV environment, and precise spatial control of the sputter sources enable the asset to perform complex sputtering processes accurately and efficiently.