Used VARIAN 3290 STQ #9180896 for sale

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Manufacturer
VARIAN
Model
3290 STQ
ID: 9180896
Vintage: 1996
Sputtering systems 1996 vintage.
VARIAN 3290 STQ is a sputtering equipment produced by VARIAN Inc. It is a high-performance magnetron sputter deposition system that enables the creation of uniform thin films for a variety of applications. VARIAN 3290STQ features three cuboid- shaped, high-power, magnetron sources that provide tightly controlled uniformity and power across the substrate, and the unit can be equipped with up to three process chambers, or "modules", to handle a variety of simultaneous processing tasks. The modular design of 3290 STQ allows the user to create multiple configurations to accommodate special requirements for wafer size, substrate thickness, and target material. The closed-loop process control provides precise deposition levels, uniformity, and repeatability under a wide range of conditions. 3290STQ has a high-resolution capacitance-manometer pressure control machine with independent control of each module. It is also equipped with a programmable controller, allowing the user to create and store up to 12 different sputter-process recipes, enabling quick, easy, and repeatable processes. VARIAN 3290 STQ has a fast operating height of 40 to 270 mm and allows for a maximum process load of up to 60 kg. It is a robust tool with a variety of advanced safety features, including an automated arc management asset, a dual interlock model, independent emergency shutoff, and a protective aluminum shield. It also has a touchscreen E-panel for complete control of all equipment processes. VARIAN 3290STQ is versatile and can be used for a variety of processes, such as thin film deposition, alloy plating, precision etching, magnetron sputtering, and reactive ion etching. It is suitable for a wide range of applications, including optoelectronics, data storage, microelectronics, and energy storage. With its impressive performance, outstanding features, and user-friendly operation, 3290 STQ is a popular choice for high-performance sputtering systems.
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