Used VARIAN 600 GLC #9253624 for sale

VARIAN 600 GLC sputtering equipment is a PVD deposition tool used in thin film deposition systems. It is specifically designed for high-rate, high-mass deposition processes such as sputtering, evaporation, chemical vapor deposition (CVD), and reactive ion etching (RIE). The system utilizes a variety of substrates such as silicon wafers, quartz plates, and other materials for sputter deposition. 600 GLC is an advanced sputter deposition tool, with a variety of features to enhance its function. It features a dual chamber design with a loading and unloading chamber, allowing for efficient substrate transfer without exposing the substrate to excessive contamination. The chamber temperature is also adjustable, allowing for a wide range of temperature control during the deposition process. The unit also features a broad range of process parameters, including sputter rates, target power levels, RF frequencies, and deposition rates. The machine also includes a high-powered magnetron source, which is ideal for metals and other materials with high conductivity. The magnetron source provides a higher power density for sputter deposition, resulting in a much higher deposition rate and greater control of the deposition process. The tool also features a gas-injection option for controlling the concentration of reactants used in the CVD process. VARIAN 600 GLC is an extremely reliable asset with a high quality design, and it has proven itself in the industry to be a valuable tool for the deposition of high mass, high-rate deposition processes. It is capable of performing processes for both industrial and research applications, and is often found in manufacturing and research and development laboratories. This model enables versatility in thin-film deposition and can be used to deposit a wide range of materials, from metals to insulators. In addition, 600 GLC can be used for a variety of experimental processes, including high-temperature annealing and rapid thermal processing. The equipment also offers excellent precision and repeatability in processes such as sputtering, allowing for accurate control of thin films.