Used VARIAN / TEL / TOKYO ELECTRON MB2-730 #196006 for sale

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VARIAN / TEL / TOKYO ELECTRON MB2-730
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ID: 196006
Wafer Size: 8"
Vintage: 1999
CVD sputtering system, 8" SMIF Type: LPT 2200 Software version V5.2bl(B2.3.2) Vacuum pump included (2) chambers 1999 vintage.
VARIAN / TEL / TOKYO ELECTRON MB2-730 sputtering system is a versatile tool used for thin film deposition and patterning. This tool provides the user with a variety of deposition techniques such as DC Magnetron sputtering, RF magnetron sputtering, and DC/RF combined with ion bombardment. TEL MB2-730 features independent process modules and a process chamber capable of processing a full substrate 10" in size. The chamber is equipped with a maximum 4 target capabilities each with their own independent power supplies. In DC magnetron sputtering processes, a DC power supply is used to generate an electrical field between the substrate and the target. This is applied to initiate the sputtering process of substrate material onto the base material. DC magnetron sputtering allows for the control of the deposition rate and uniformity by adjusting the current and voltage for each target. RF magnetron sputtering uses a RF power supply to generate an electrical field between the target and the substrate. This process is typically used to sputter material in shapes such as lines, trenches, and polygons. Furthermore, this can also be used to deposit materials that are difficult to sputter. VARIAN MB2-730 is also capable of combining DC and RF modes into a single process. Utilizing this process, one can deposit materials with a high deposition rate while achieving a uniform film layer with a width of 20µm and a height of 1µm. Additionally, combining DC/RF with ion bombardment enables the tool to achieve faster process times with a high-quality film. TOKYO ELECTRON MB2-730 also features an in-situ cleaning procedure. The automated cleaning process uses argon gas to clean the chamber and cooling the target. For temperature control, MB2-730 utilizes a water-cooled secondary chamber. This cools the target to prevent annealing effects, and hence the device is able to deposit materials with low inter-diffusion and excellent adhesion. VARIAN / TEL / TOKYO ELECTRON MB2-730 is an easy-to-use tool that is ideal for both small and large-scale applications. Its high user-friendliness and reliable operation allow the user to achieve high-quality results in a efficient manner. With its versatility and flexibility, TEL MB2-730 is one of the most popular tools in the thin film deposition and patterning industry.
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