Used EBARA C-1120-008-0001 #9130629 for sale

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EBARA C-1120-008-0001
Sold
ID: 9130629
Bevel polisher.
EBARA C-1120-008-0001 is a wafer grinding, lapping and polishing equipment designed for precision and repeatability. This system is built on a modular platform and can be customized to meet specific customer requirements. It consists of a single-stage unit, which can be configured for either dry or wet operation. The machine is optimized to produce flat and smooth surfaces in minimal processing times. This is due to its combination of lapping and polishing plates, which are designed to create optimal contact pressures. In addition, each plate is equipped with two counter-rotating drive shafts to provide lateral motion and reduce the number of strokes required for grinding. The tool is powered by a variable frequency drive motor, which has speed adjustment ranges of zero to 2,000 RPM. The asset is designed to function in a wide variety of environments and conditions, including temperatures of -10 to +50 degrees Celsius. The model is also equipped with a monitoring equipment that allows it to detect and react to changes in process parameters. The lapping plate is available in either diamond or pumice stone, and its design allows for rapid, uniform deformation rates of inhomogeneous materials. The lapping plate is also extremely durable and can withstand long-term use and high pressures. The polishing plate is designed to generate a high-abrasive contact pressure on the surface of the wafer, resulting in a smooth, glossy finish. This is accomplished by continuously monitoring the surface of the wafer to ensure that the same surface finish is attained on each wafer. The polishing plates are made from aluminum oxide and have a hardness rating of 9.0 on the Mohs scale, making them resistant to wear and tear. Finally, C-1120-008-0001 is equipped with a control unit that allows for the monitoring and control of the entire process, allowing technicians to make quick adjustments to the process and respond to changes in the parameters. This is essential for maintaining consistent results and ensuring that the highest quality wafer is produced.
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