Used DNS / DAINIPPON 80A #9162944 for sale

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DNS / DAINIPPON 80A
Sold
Manufacturer
DNS / DAINIPPON
Model
80A
ID: 9162944
Wafer Size: 6"
Vintage: 1998
Developer system, 6" 1998 vintage.
DNS / DAINIPPON 80A is an advanced dry film photoresist equipment specifically designed for use in semiconductor device fabrication. This system utilizes a PVC substrate which has been pre-coated with a thin layer of resist and subsequently cured. This cured resist layer is sensitive to both ultraviolet or electron beam radiation and acts as an effective mask for photolithography. The resistance of the layer can be easily tailored to specific customer requirements, and offers superior line-edge roughness when compared to other similar systems. It also enables high resolution imaging on thin wiring patterns with significant advantages during the dry film resist application process. The method of applying the resist is also relatively simple, as it is available in sheets, thus minimizing the processes needed before photolithography. Moreover, the unit eliminates any potential problems caused due to the use of solvent-based photoresists, such as resist fogging and edge-beading, which can result in a decreased quality of the final semiconductor device due to poor exposure. In addition, the application of this material results in a significantly faster etch rate compared to conventional solvents. This leads to a greater control of the etch rate, allowing the production of superior devices. The machine is further assisted by some of the features of the fluorosilane carrier which is used as a carrier solvent for the resist. The fluorosilane carrier interacts with the resist molecules, reducing their rigidity and increasing adhesion while also acting as a barrier against attack by reactive ion etching. This feature is especially desirable when working with structures with highly complex patterns. The tool also has some superior heat resistance properties, making it suitable for use among high-temperature environments. Furthermore, it has the added advantage of being one of the most economical of the dry film systems available, making it a viable choice for many types of semiconductor device fabrication. To sum up, DNS 80A is an advanced dry film photoresist asset ideal for fabricating semiconductor devices due to its superior line-edge roughness, increased resolution, and etch-rate control features. The fluorosilane carrier within the model provides increased adhesion and resistance against reactive ion etching, while its enhanced heat resistance makes it suitable for high temperature environments. Furthermore, its economical price makes it an attractive option for many device fabrications.
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