Used K&S 971 #9077085 for sale

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K&S 971
Sold
Manufacturer
K&S
Model
971
ID: 9077085
Wafer Size: up to 8"
Microwash station, up to 8" Handles up to 10" diagonal substrates For sawed/scribed wafers, photomask and other substrate cleaning Oscillation High pressure DI spray arm - up to 2000 psi Filtration at 0.2um Combined chamber exhaust and drain Built in safety interlocks Nitrogen dry Infrared heat lamp 115V, 50/60 Hz, 6A Missing cone.
K&S 971 is a wafer and mask scrubber designed for the semiconductor fabrication industry. It is used to clean the surfaces of the wafer and mask during the manufacturing process, ensuring that they are free of microscopic particles and contaminants. 971 uses a combination of mechanical agitation and fluid-borne materials to remove particles from the surfaces of both the wafers and masks. K&S 971 utilizes a mechanical scrubbing action that is powered by a DC motor. This motor produces a set of oscillations of up to 500 RPM which has an amplitude of 0.5 mm resulting in a large mechanical abrasion to the surface of the materials being processed. The scrubbing action is augmented by an integrated chemical cleaning equipment which utilizes a specific-type fluid to break down and flush away any microscopic contaminants that may have been left on the surface of the wafers and masks. 971 also features adjustable pressure and nozzle control features that enable the user to set the precise scrubbing pressure and nozzle angle to achieve the optimal cleaning action. This ensures that the scrubbing action is powerful enough to remove any particles while not being overly abrasive and damaging to the materials underneath. K&S 971 contains a self-contained filtration system that is capable of removing both solids and aerosol particles from the scrubbing fluid, thus ensuring that the fluid is kept clean and any particles are removed before they are re-circulated back into the cleaning unit. There is also a material recovery machine which collects and stores any particles that have been removed from the wafers and masks during the scrubbing process. This recovery tool is important for reducing the waste generated during the scrubbing process. 971 also features an automated chamber clean asset which allows the user to easily and quickly clean the scrubbing chamber after a process is complete. This model flushes away any particles left on the chamber walls, ensuring that no particles are left behind during the scrubbing process. Additionally, K&S 971 also has a wide range of safety features such as water-tight seals which prevents any liquids from escaping the equipment and also safeguards the operator from any hazardous vapours or sprays generated during the scrubbing process. Overall, 971 is an efficient and effective scrubber designed for the semiconductor manufacturing process. It features an integrated mechanical and chemical action that ensures the surfaces of both the wafers and masks are kept clean and free from contaminants during the scrubbing process. Additionally, its adjustable pressure and nozzle control features, self-contained filtration system, material recovery unit, and automated chamber cleaning machine all work together to maximize the scrubbing performance while also ensuring the safety of the operator.
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