Used SSEC Evergreen 300ML Series III #9230467 for sale

SSEC Evergreen 300ML Series III is a fully automatic wafer and mask scrubber designed for the cleaning and preparation of photomasks, reticles and other flat LSI components. This scrubber is equipped with two separate cleaning chambers which provide individually calibrated and controllable cleaning and scrubbing operations. The first, an Injection and Rinse Chamber, utilizes an injection method to replenish fluids and power the scrubber's cleaning action. The scrubber is outfitted with an electronically adjustable back-pressure valve and nozzle that allows the user to accurately control and alter fluid distribution, maximizing cleaning efficiency while minimizing particle redistribution across the wafer surface. The second chamber is the Mask and Wafer Chamber, designed to provide a cleaning environment for both masks and wafers. This chamber contains a two-stage scrubber mechanism, providing simultaneous compact wet scrubbing and full-surface wet scrubbing, electrolytic plasma-arc cleaning and accelerated rinsing actions. The two-stage scrubber mechanism can be freely adjusted to permit special cleaning patterns, providing a flexible and highly effective cleaning process. The scrubber is further equipped with a particle viewing window, allowing users to monitor particle sizes and amounts. The scrubber is also installed with a user-friendly graphical user interface (GUI), providing easy operation and simplified remote settings. The scrubber can be conveniently and safely operated and maintained, as it is designed for self-diagnosis and has multiple alarms for operation and safety monitoring. Overall, Evergreen 300ML Series III Wafer and Mask Scrubber provides a highly efficient and reliable cleaning process, ensuring the best quality of components during the preparation process. With its automated controls and feature-rich characteristics, this powerful scrubber is the ideal choice for a wide variety of industries requiring precision and uniformity when it comes to cleaning and preparing photomasks, reticles, and other fragile LSI components.