Used ASML PAS 2500 / 40 #9198547 for sale

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ASML PAS 2500 / 40
Sold
Manufacturer
ASML
Model
PAS 2500 / 40
ID: 9198547
Wafer Size: 5"
Steppers, 5".
ASML PAS 2500 / 40 is an advanced lithography equipment used in semiconductor manufacturing processes. Based on deep ultraviolet optical lithography, the system is designed for the 130nm chip fabrication process, making it ideal for low-power, high-performance integrated circuits. The unit uses a single large-area scanner to expose a Photo-Resist (PR) layer on the wafer, producing micro-structures in a single step. The imaging optics of the stepper include an alignment machine, a high-Numerical Aperture (NA) lens, a high-sensitivity illumination tool, and a double-sided imaging lens. This combination allows for precise control over image placement and uniformity. Additionally, the asset features a unique Overlay Recognition Model (ORS), which allows for high alignment accuracy with no need for manual cropping or scanning. At its core, ASML PAS 2500/40 utilizes a three-axis stage to move in sub-nanometer increments, allowing for the highest precision in lithographic alignment. This state-of-the-art technology combines three linear motor stages—X, Y, and Theta (angular)—to control the precise alignment of the wafer, resulting in precisely aligned die patterns. PAS 2500 / 40 also features an integrated Atmospheric Control (AC) equipment, which maintains a precise and clean environment in the stepper chamber. This controlled environment helps to improve imaging performance, extend die life, and increase uniformity and throughput of devices. The system also provides precise optical overlay, closed-loop alignment and process control capabilities, as well as superior field uniformity. PAS 2500/40 is an advanced, user-friendly lithography unit designed for use in the 130nm chip fabrication process. The machine provides superior imaging performance, precise optical overlay capabilities, extended die life, and high-precision motion control. Incorporating advanced technologies such as a high-NA lens, a high-sensitivity illumination tool, and an Atmospheric Control asset, ASML PAS 2500 / 40 provides unparalleled precision and accuracy.
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