Used CANON FPA 2000 i1 #100914 for sale

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Manufacturer
CANON
Model
FPA 2000 i1
ID: 100914
Wafer Size: 6"
Vintage: 1991
i-Line Stepper machine, 6" Reticle: 5" Stored in a cleanroom 1991 vintage.
CANON FPA 2000 i1 is a high-precision, optical, high-end wafer stepper. It is used for the production of complex semiconductor structures or integrated circuits (ICs). It is an industry-standard equipment capable of delivering extremely precise patterns and structures with nanometer accuracy. The system is equipped with an i-line projection and 405nm μ-ROC (reflection-mode off-axis) illumination source. This combination provides excellent precision and small spot size due to its wavelength's capability to transmit and reflect light efficiently. The platform also features a highly-sensitive, three-camera automated alignment and control unit. This feature is used to precisely align and control a wide range of device geometries and configurations, enabling precise patterning and masking. The stepper's high-precision stage machine allows the operator to accurately adjust and position a device for precise patterning. This is achieved with the help of precise, omni-directional motion controllers, which provide speed and accuracy for every adjustment made. The NPF (Numerical Proximity Focus) function allows the user to quickly align and focus the device, further improving accuracy and throughput. CANON FPA2000-I1 also employs a sophisticated exposure and resist control scheme. This scheme combines different exposure techniques such as pulse-width modulation (PWM), backside expose, and long-time exposure, to ensure precise patterning results. The tool also supports a full digital prototyping environment, enabling fast design simulation and optimization. This asset is ideal for applications that require highly precise patterns with tight tolerances and excellent surface accuracy. FPA-2000I1 offers a high resolution checker board optical model, enabling operators to inspect a device pattern for accuracy and defects. It also features a four-point image measurement equipment that can automatically detect critical defects such as shorting, bridging, and misalignment. The system further offers a wide range of performance monitoring tools, including diagnostics and performance optimization tools. CANON FPA 2000 I 1 wafer stepper is a powerful, high-precision production platform capable of delivering precise patterns with nanometer accuracy and reliability. Its combination of highly accurate motion controllers, optical and resist control, and performance monitoring tools make it an ideal platform for task-critical applications.
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