Used CANON FPA 3000 EX4 #293586146 for sale

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Manufacturer
CANON
Model
FPA 3000 EX4
ID: 293586146
Vintage: 1998
Stepper CYMER ELS 5300 Laser system CGWS-01 O-Zone generator No lens data 1998 vintage.
CANON FPA 3000 EX4 is a high-precision wafer stepper designed for production of semiconductor chips. It is capable of handling wafers up to 300mm in diameter and is equipped with an eight-channel, two-stage optical equipment for high-precision and alignment accuracy. This stepper can also handle both single and multiple exposure shots, with the capability to customize exposure parameters for processed wafers. CANON FPA-3000EX4 is designed with a newly developed vector-control shot-shifting system and fine image-forming lens. This ensures a constant focus level and a consistent image quality across the entire wafer. Its integrated vibration isolation unit eliminates vibration during exposure, minimizing the damping time of temperature instability as a result of thermal drift. It is also equipped with a high-speed I/O controller, which enables fast processing of large volumes of data during the exposure process. For high imaging capability, FPA-3000 EX4 is fitted with the newly developed EX4 Imaging Control Machine. This offers a highly accurate and reliable image display that simplifies the entire automatic alignment process. It also comes with a newly designed High-Precision Autofocus Tool (HPAS) designed to find the optimal focus level whenever the wafer thickness changes. FPA-3000EX4 offers a high-efficiency illumination asset for optimal energy utilization. With its six-laser reflector, this stepper can attain energy intensities of up to 7,000 mW㎡ for photolithographic processes. Its built-in Micro Scissors Tilt (MST) compensator prevents cross-slope errors during exposure by rapidly and accurately detecting the tilt of the shot. For user convenience, FPA 3000 EX4 is fitted with a user-friendly monitor to allow operators to view wafer alignment while controlling exposure parameters. It also has a preview-mode function that allows the user to look at a pre-exposure shot to check the alignment of processed wafers. This provides fast and accurate positioning of exposure during the manufacturing process. To provide stable processing of wafers, CANON FPA-3000 EX4 offers an air-cleanliness control feature that reduces particulate contamination and optimizes its clean environment to maintain a clean wafer surface. It also has a helium exchange model that can reduce X-ray damage from wafers. CANON FPA 3000 EX4 is an ideal choice for precision wafer stepper needs due to its reliable performance, high speeds, and precision alignment. Its comprehensive features make it an excellent choice for the production of semiconductor chips.
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