Used KMS Vision #9223591 for sale

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Manufacturer
KMS
Model
Vision
ID: 9223591
Vintage: 2008
Scanner Measurement system 2008 vintage.
KMS Vision is an advanced wafer stepper which enables high yield and optical performance in semiconductor device fabrication processes. It allows precision alignment of the wafer to the mask for pattern etching. The system utilizes an advanced lithography solution featuring spectral imaging technology for perfect images on the wafer and has its own proprietary oversampling technique to improve the accuracy and repeatability of the lithography step. Vision system is composed of two major components: the stepper and the ancillary systems. The stepper is a structural platform of metal and precision linear guides on which the optical elements, the stages and the photomask are mounted. The stepper provides for accurate position control to the components for placement of the photomask on the substrate, for exact alignment and for repeatability of the pattern onto the wafer with high accuracy. The ancillary systems include an alignment unit, an illuminator, and a camera. The camera is adjustable to analyze the pixels of the photomask and identify desired features, while the alignment unit lets users align multiple features quickly and precisely. The illuminator illuminates the photomask accurately and offers a bright light source for alignment and patterning. This advanced wafer stepper from KMS Vision has unique capabilities like spectrographic imaging, hybrid wafer mapping, and advanced lithography systems for higher production speed and accuracy. Its high-precision precision alignment feature enables it to pattern features of the photomask down to 1 micron accurately and its subs 0.2 micron optical resolution gives it the edge over similar products. With an ultra-high resolution positioning capability it can accurately place the mask in the smallest areas of the wafer resulting in higher yields. Vision also offers amazing spot size variation of 4X which allows multiple levels of illumination. The advanced control system can optimize the pattern in order to achieve better focus for improved optical performance. Moreover, its dynamic single lens correction offers a wide range of optical correction options for multiple exposure objectives and its ability to detect out-of-focus patterns before exposure allows higher yields and improved optical performance. Overall, KMS Vision advanced high-speed wafer stepper is an ideal choice for high precision and high-yield substrate fabrication operations where throughput and performance are essential.
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