Used NIKON NSR 1505 G6E #9120694 for sale

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NIKON NSR 1505 G6E
Sold
Manufacturer
NIKON
Model
NSR 1505 G6E
ID: 9120694
Wafer Size: 5"
Stepper, 5" Resolution: 0.65㎛ D.O.F: range ≥ 1.5 ㎛ Lens distortion: ≤±0.09 ㎛ Focus stability: ≤0.6 ㎛ Wafer flatness: ≤3 ㎛ Uniformity: ≤±2.0% Reticle rotation accuracy: ±0.02 ㎛ Overlay: |X| + 3σ ≤ 0.2㎛ EGA alignment accuracy: |X| + 3σ ≤ 0.14 ㎛ Stepping accuracy: 3σ ≤ 0.09 ㎛ Pre-alignment repeatability: 3σ ≤ 2 5㎛ Utilities: Electrical power: 200V±20 V, 3 Phase, 50 A, 50/60 Hz Air: ≥3 kg/cm2, 5 L/min, 1/4" Vacuum: ≤300 mmHg, 50 L/min, 1/4" PCW: 16°-32°C, ≥3 kg/c, 18 L/min, 1/2" Thermal exhaust: 1000L/min, 125mm Drain: 1".
NIKON NSR 1505 G6E is a multi-field, high-end wafer stepper designed to facilitate advanced semiconductor circuitry manufacturing. With its high level of precision and repeatable accuracy, it offers excellent performance for a wide range of device types. NIKON NSR-1505G6E uses 4x and 5x scan exposure modes to make it suitable for any device or application. The various projection lenses available - including two aspherical lenses, a telecentric lens, and an ultra-telecentric lens - provide extremely accurate results across a wide range of focal lengths. The device also features lens scanning mode, which increases the efficiency of scan exposure by performing multiple exposures in a single step. NSR 1505 G6E is designed to operate in a cleanroom environment, using an exacting degree of vacuum control. The control equipment includes a ultra-low particulate sensing unit, which monitors the airborne particle concentration in the stepper. This provides ongoing control for ensuring a stable and clean operating environment. NSR-1505G6E has multiple user-optional features, that allow the end user to customize the device to their specific requirements. One of these options is an efficient exposure strategy that uses a combination of high-resolution vignetting and optimization functions. This helps reduce the number of optical effects caused by misalignment or aberration, providing a high level of accuracy. NIKON NSR 1505 G6E can accept a variety of half-pitch geometry patterns, including line distance and oblique lines, to support a range of applications. Other features include auto-alignment and centering routines, as well as in-line testing capabilities which provide quick tests to validate wafer process results. NIKON NSR-1505G6E includes various optional automation packages that increase system accuracy and productivity. These include a powerful multi-track stage, which allows the stepper to move more rapidly and precisely, and a vision alignment unit that measures and compares incoming wafers with stored reference images. The stepper can also be integrated with existing production facilities, in order to streamline workflow, reduce downtime, and optimize operational efficiency. Overall, NSR 1505 G6E is a powerful and precise stepper that provides excellent results for wafer processing. Its multi-field optics and vacuum control machine make it a good choice for high-end wafer fabrication. The various automation packages and other user-options often make it the go-to choice for advanced semiconductor production.
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