Used NIKON NSR 1755 i7A #9256260 for sale
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ID: 9256260
Wafer Size: 4"-8"
Vintage: 1992
i-Line stepper, 4"-8"
Reticle, 5"
Thickness: 0.09"
Material: Quartz glass / Low-expansion glass
Type: Low-reflection chromium mask (Single layer chromium also acceptable)
Resolution: 0.50 µm
Lens distortion: ±0.07 µm
Magnification control: ±0.03 µm
Maximum exposure area: 24.74 mm dia
Reticle bind setting accuracy: +0.4 +0.8 mm
Exposure power: 600 mW / cm³
Integrated exposure stability: ±1.4%
Illumination uniformity: ±1.5%
Focus calibration repeatability: Within 0.15 µm
Reduction ratio: 5:1
Field: 17.5
O.45 Resolution (NA): 0.5
Global alignment: 0.18 um
Reticle rotation:
Absolute value: Within ±0.02 µm of target value
Repeatability: Within 0.02µm
Alignment accuracy:
WGA X+3ơ ≤ 0.18 µm
EGA X+3ơ ≤ 0.11 µm
Array orthogonality: ±0.2 Sec
Stepping precision: 0.8 µm (3s)
Reticle pre-alignment accuracy: ±2 mm
Interchangeability: ±0.12 µm
Stepping rate:
<11 Sec (100 mm)
<20 Sec (125 mm)
<28 Sec (150 mm)
Throughput:
WGA:
<21 min (125 mm)
<21 min (125 mm)
<22 min 40 sec (150 mm)
EGA:
<21 min (125 mm)
<21 min 15 sec (125 mm)
<24 min 50 sec (150 mm)
1992 vintage.
NIKON NSR 1755 i7A is a high-performance wafer stepper equipment designed for single wafer lithography applications. It is equipped with NIKON latest generation of NIKON Semiconductor Lithography Optics (NSL Optics), which employ an ultra-precise imaging technology to enable precise fabrication of complex integrated circuit (IC) patterns. NIKON NSR 1755I7A is built on NIKON "i platform", which gives the wafer stepper superior stability and accuracy for single wafer lithography. The i platform utilizes a high-precision, direct-drive stepping motor to move the wafer stage and further improve the accuracy and stability of the system. The platform also includes a high-speed acceleration control unit for rapid pattern recognition and phase matching. The machine is equipped with two advanced NIKON Semiconductor Lithography Optics (NSL Optics) systems, providing superior performance and high resolution for exposure of 2D and 3D IC patterns. The advanced optics systems have a large resolution range, from 0.2 microns (2 nm) to 20 microns (200 nm). Additionally, the tool can be configured with several different options of illumination, including Constant K, Calibrated K, and Intensity K illumination. For repeatable accuracy and reliability, NSR-1755I7A incorporates an advanced auto-align asset. The auto-align model can accurately recognize the position of the wafer and align it with the imaging optics without the need for manual intervention in alignment. This helps to reduce the number of alignment errors and decrease the time needed for wafer placement. NIKON NSR 1755 I 7 A is also equipped with a high-speed wafer handling equipment, which performs fast wafer exchange at rates of up to 2.5 wafers per second. This helps to reduce process time and provides tremendous throughput while maintaining high accuracy. Furthermore, the stepper is also equipped with a process diagnostic system, which can quickly detect defects and anomalies during wafer exposure. Overall, NSR-1755 I 7 A wafer stepper is an advanced unit that provides superior performance for single wafer lithography. It is designed for high repeatability and accuracy and offers a wide range of resolution and illumination support. The advanced automation and process diagnostics ensure that the machine can provide reliable and defect-free IC patterns with optimal throughput.
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