Used NIKON NSR 1755 i7A #9309533 for sale

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Manufacturer
NIKON
Model
NSR 1755 i7A
ID: 9309533
Stepper.
NIKON NSR 1755 i7A wafer stepper is an industry leading, precision-controlled equipment designed for the fabrication of integrated circuits (ICs) on the most advanced wafer-based substrates. This system offers advanced lithography capabilities for both 3-dimensional and planar processes. Its high resolution exposure unit features a low divergence LED light source with a long distance imaging accuracy of 4nm (4×10-9m). It has an extremely precise wafer stage capable of moving with nanometer dimensional accuracy at a speed of 3 nanometers/second, allowing for high resolution exposure of various devices and circuits. NIKON NSR 1755I7A utilizes an air bearing spindle to minimize lateral registration error and batch process time. Its wafer-handling capabilities include loading and unloading of up to 8-inch wafer substrates into a cassette or onto a manual chuck at speeds up to 70mm/sec. Its reticle handling and alignment capabilities feature an advanced and powerful pellicle with an imaging accuracy of 0.25um (0.25×10-6m). Additionally, NSR-1755I7A also includes advanced and powerful stepper optics. Its optical machine employs a state-of-the-art, hybrid TFT-AMLCD projection optics with a high numerical aperture of 0.5. NSR 1755 i7A also features a host of environmental control mechanisms. It is capable of detecting and controlling the temperature of its working environment to within ±1°C. It has resistance to both high and low temperature climates (-25°C ~ +45°C). In addition, it is also dust and particle resistant, capable of controlling dust particles down to 0.3〃m. Furthermore, it includes an anti-vibration design that fastens the newly designed, more rigid manufacturer to minimize the level of vibration and improve process stability. Overall, NIKON NSR-1755 I 7 A is a reliable and advanced wafer stepper capable of producing high resolution integrated circuits with exceptional accuracy and precision. Its high resolution exposure tool, wafer-handling capabilities, reticle alignment and optical asset, and environmental control measures make it a sophisticated yet reliable tool for IC fabrication. Its exceptional performance standards make it an ideal choice for production processes related to integrated circuit manufacturing.
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