Used NIKON NSR 2005 i10C #9096007 for sale

NIKON NSR 2005 i10C is a state-of-the-art wafer stepper designed for precision photolithography applications. This stepper utilizes advanced optics, cutting-edge software, and advanced alignment technologies to produce high-performance results for the semiconductor industry. NIKON NSR i10C is equipped with NIKON Advanced Lens Equipment (ALS). This system incorporates high-performance lenses with improved resolution and image quality. The ALS also provides improved light transmission, better uniformity and contrast, and faster response time. Additionally, the ALS features low aberration, optimized field curvature, low vibration, and auto-alignment. NIKON NSR i10C features a high-end wafer alignment unit that accurately measures wafer skew and provides precise correction of aberrations. This machine ensures excellent pattern placement and minimized off-center registration. NIKON optical zoom aligner provides the operator with an accurate shot-to-shot overlay, which further boosts the performance of NIKON NSR i10C. NIKON NSR i10C also offers advanced image software including the e-Stepper module, which provides full integration of mask, substrate, and CR tool data. The e-Stepper module is designed for optimal accuracy, speed, and throughput and provides a powerful graphical interface for manipulating pattern data. In addition, NIKON NSR i10C is equipped with advanced process monitoring capabilities. The Enhanced Process Window monitors alignment and exposure process performance in real time, allowing the user to respond quickly to process shifts. This feature also allows for the optimization of control parameters during development and production process control. NIKON NSR i10C provides features that fully optimize the photomask process and ensure the highest pattern placement accuracy and image quality. From its highly accurate optical asset with advanced aligner to its powerful image software and process monitoring capabilities, NIKON NSR i10C is a powerful and reliable solution for precision photolithography applications.