Used NIKON NSR 2005 i10C #9311681 for sale
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ID: 9311681
Wafer Size: 6"
Vintage: 1994
Stepper, 6"
NEMA Box electric source
ASAHI N1A Chamber
Chamber width: 1800 mm
Temperature:
Chamber / LTC / IATC: 23°C
Computer type: PDP11/93
HP 5517B Laser
LSA Laser: 10 mW
Fixed reticle microscope
NIKON ITV Camera
Wafer type: 6" Flat type
Silicon wafer
OF Detection: NIKON Original Type
Wafer loader: NIKON Type2 (A1)
Reticle library slots: (13) Main slots
Wafer carrier table: Left and right
Reticle, 6"
LSA / FIA Sensor
Bar code reader
Rack type: Normal right position
Set atmospheric pressure: Normal
Altitude: Ground level
Constant Backup data
No Edge exposure
No PPD
No inline
1994 vintage.
NIKON NSR 2005 i10C is a state-of-the-art wafer stepper that provides high-precision lithography solutions. With its advanced exposure techniques, NIKON NSR 2005I10C can be used to produce patterns and shapes with high resolution. It is a highly advanced exposure equipment for fabricating integrated circuits, micromechanical components, and micromachines. NSR-2005I10C offers a field-of-view of 7.2 mm by 7.2 mm and a theoretical minimum vector size of 0.18µm. Its step motor provides high speed and efficient alignment of the projection optics. The system is also equipped with an exposure control unit which allows programmable overall exposure time and dose rate for optimized processing of any device. NIKON NSR-2005I10C offers advanced exposure modes for producing complex shapes, such as Multi-Fiber, Moon, Grid and Variable PR Mask modes. These expose the wafer in multiple patterns simultaneously and allow the fabrication of high aspect ratio structures on the semiconductor devices. Additionally, NIKON NSR-2005 I 10 C features a multi-purpose reticle changer, enabling the user to select from a number of different reticles for increased flexibility and improved imaging options. In order to provide maximum image quality, NSR 2005I10C is equipped with a highly efficient optics unit, allowing for extremely small aberrations of the light signals. Additionally, the wafer stepper is equipped with two objective lenses which can be used to produce different levels of resolution. NSR-2005 I 10 C is designed with built-in safety features, detecting any abnormally high temperatures or levels of humidity and automatically shutting down the machine. Furthermore, the tool features an integrated particle counter, which allows the user to detect any particles present in the imaging asset. NSR 2005 i10C is the ideal choice for high resolution, low cost lithography solutions. Its advanced exposure techniques and high efficiency optics model make it an excellent choice for the fabrication of integrated circuits, micro-mechanical components, and micro-machines.
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